Upon emigrating from Kiev in 1979, Yan Borodovsky worked at Syncal Corporation, developing semiconductor thermoelectric conversion materials for deep space satellite power supplies. His lithography career started at AMD and startup ATEQ, where he developed the optical path design and assembly, optics test stand, and resist process for the CORE 2000 laser writer. Thereafter, during 28 years at Intel, he led development of the lithography roadmap, numerous novel processes, tools, and process-design co-optimization to enable Intel leadership from 0.5micron to 7nm. He was appointed Intel Fellow in 1999 and Intel Sr. Fellow in 2003. He is also a SPIE Fellow and recipient of the SPIE Frits Zernike Award.