Dr. Stephen Renwick has been working on leading-edge lithography since starting with the first ArF scanners in 1996. He has worked with Nikon subsidiaries in the U.S. since 2000 and is currently the Director of Imaging Physics at Nikon Research Corp of America. Steve is a frequent contributor to industry conferences such as SPIE Advanced Lithography and the invitation-only Lithography Workshop. At Nikon, Steve has been engaged in critical leading-edge lithography projects including scanner matching for OPC, detailed scanner performance prediction, and investigations of lithographic extension technologies like directed self-assembly. Steve's work currently focuses on the development of imaging solutions to further extend ArF immersion lithography capabilities. Steve holds a Ph.D. in atomic physics from Wesleyan University.