Caitlin Broglie started her career at IBM’s East Fishkill 300mm manufacturing facility in 2011. There she contributed to multiple technologies including 32nm, 22nm, and 14nm products. Caitlin held various engineering roles but was primarily responsible for the development and optimization of processes involving resist strips, thin film etches, metal etches, surface and contact cleans. In 2014, Caitlin joined the advanced technology team at SCREEN SPE U.S.A. She continues to advance wet etch processes and equipment to meet customer technology targets in performance, yield, reliability, and cost. Caitlin received her B.S. degree in chemical engineering from the University of Notre Dame.