Dr. Bryan Barnes serves as Project Leader for the Optical Methods for 3-D Nanostructure Metrology project in the Engineering Physics Division of NIST’s Physical Measurement Laboratory. He is also the co-chair of the North America Chapter of the SEMI Microlithography Committee, which through voluntary compliance enhances the manufacturing capability of the semiconductor industry through consensus-based specifications. The author of more than 40 proceeding and journal papers, he also holds a patent in overlay metrology.
Bryan was co-recipient of a 2013 R&D 100 Award for Quantitative Hybrid Metrology, a new metrology technique that embeds reference measurements with uncertainties into model-based measurements to yield parametric uncertainties that are as small or smaller than can be achieved by either approach independently. He was also recognized with a 2016 Department of Commerce Silver Medal for pioneering advances in optics, imaging structures 30-times smaller than the wavelength of light with near atomic accuracy. His current research interests include optical defect inspection, hybrid metrology, and critical-dimension metrology of features sized more than an order of magnitude below traditional optical resolution limits. Bryan received a PhD in Physics from the University of Wisconsin-Madison in 2004.